Open Call // Web Residencies 2017 by Schloss Solitude & ZKM

Article by Lisa Birch in Berlin // Monday, Feb. 27, 2017

Akademie Schloss Solitude and ZKM | Center for Art and Media are joining forces to offer an online web residency program aimed at supporting talent within the digital scene. Artists working within any web-based practices are encouraged to apply for the residency.

There will be three open calls throughout 2017 for the web residencies and this first open call will focus on the act of producing evidence through the use of artistic practice. The call is for those who consider themselves artists, hackers, technologic experts, computer scientists and activists. It aims to focus on acts of truth-telling, leaking counter-surveillance and exposing misconducts and violations. The residency is open to all sorts of discussions, such as how technology can be used as part of a political reinvention, the role of art in the framework of whistleblowing and leaking, types of tactics and strategies for resistance and critical interventions that question the concept of evidence. The web residency invites artists to experiment with digital technologies, digital art, new art forms and communication, and to use digital space as a means to reach beyond geographical and institutional borders.

The residency will be carried out exclusively online and the works will be presented on and on the ZKM website. The selected applicants will have direct contact with a professional network of institutions throughout the 4-week period and will be rewarded with 500 USD to support the creation of the project

All applications will be accepted in the formats of website, installations and software, applications, presentation slides, videos, writing, and social media projects. Applicants wishing to apply must submit a headline, a short biography, a PDF portfolio, a header image and a concept text in English.

The application period is between February 27-March 10, 2017. The residency will run for four weeks between March 20-April 17, 2017.

Application Info

Applications are accepted via the online form under
Deadline: March 10, 2017

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